Автор: Milani, Paolo Название: Cluster Beam Deposition Of Functional Nanomaterials And Devices,15 ISBN: 0081025157 ISBN-13(EAN): 9780081025154 Издательство: Elsevier Science Рейтинг: Цена: 190890.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание:
Cluster Beam Deposition of Functional Nanomaterials and Devices, Volume 15, provides up-to-date information on the CBD of novel nanomaterials and devices. The book offers an overview of gas phase synthesis in a range of nanoparticles, along with discussions on the development of several devices and applications. Applications include, but are not limited to catalysis, smart nanocomposites, nanoprobes, electronic devices, gas sensors and biosensors. This is an important reference source for materials scientists and engineers who want to learn more about this sustainable, innovative manufacturing technology.
Автор: Rosa C?rdoba Castillo Название: Functional Nanostructures Fabricated by Focused Electron/Ion Beam Induced Deposition ISBN: 3319375539 ISBN-13(EAN): 9783319375533 Издательство: Springer Рейтинг: Цена: 87060.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This book offers a detailed study of functional nanostructures (ferromagnetic, superconducting, metallic and semiconducting) fabricated by focused electron/ion beam induced deposition techniques.
Автор: Oscar Alejandro Oviedo; Luis Reinaudi; Silvana Gar Название: Underpotential Deposition ISBN: 3319243926 ISBN-13(EAN): 9783319243924 Издательство: Springer Рейтинг: Цена: 121890.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: They also discuss real surface determinations and layer-by-layer growth of ultrathin films, as well as the very latest modeling approaches to UPD based on nanothermodynamics, statistical mechanics, molecular dynamics and Monte-Carlo simulations.
Автор: Minier Название: Particles in Wall-Bounded Turbulent Flows: Deposition, Re-Suspension and Agglomeration ISBN: 3319415662 ISBN-13(EAN): 9783319415666 Издательство: Springer Рейтинг: Цена: 139750.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: The book presents an up-to-date review of turbulent two-phase flows with the dispersed phase, with an emphasis on the dynamics in the near-wall region. Also included are models of particle dynamics in wall-bounded turbulent flows, and a description of particle surface interactions including muti-layer deposition and re-suspension.
Автор: Rasheedat Modupe Mahamood Название: Laser Metal Deposition Process of Metals, Alloys, and Composite Materials ISBN: 3319879189 ISBN-13(EAN): 9783319879185 Издательство: Springer Рейтинг: Цена: 107130.00 T Наличие на складе: Поставка под заказ. Описание: This book highlights the industrial potential and explains the physics behind laser metal deposition (LMD) technology. It describes the laser metal deposition (LMD) process with the help of numerous diagrams and photographs of real-world process situations, ranging from the fabrication of parts to the repair of existing products, and includes case studies from current research in this field. Consumer demand is moving away from standardized products to customized ones, and to remain competitive manufacturers require manufacturing processes that are flexible and able to meet consumer demand at low cost and on schedule. Laser metal deposition (LMD) is a promising alternative manufacturing process in this context. This book enables researchers and professionals in industry gain a better understanding of the LMD process, which they can then use in real-world applications. It also helps spur on further innovations.
Автор: J. Mazumder; O. Conde; R. Vilar; W. Steen Название: Laser Processing: Surface Treatment and Film Deposition ISBN: 9401065721 ISBN-13(EAN): 9789401065726 Издательство: Springer Рейтинг: Цена: 81050.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Proceedings of the NATO Advanced Study Institute, Sesimbra, Portugal, July 3-16, 1994
Автор: Yasuda Hirotsugu Название: Magneto Luminous Chemical Vapor Deposition ISBN: 1439838771 ISBN-13(EAN): 9781439838778 Издательство: Taylor&Francis Рейтинг: Цена: 265410.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание:
The magneto luminous chemical vapor deposition (MLCVD) method is the perfect example of the "front-end green process." It employs an entirely new process that expends the minimum amount of materials in gas phase, yields virtually no effluent, and therefore requires no environmental remediation. Unlike the "back-end green process," which calls for add-on processes to deal with effluent problems, the newer MLCVD approach is a completely different phenomenon that has never been adequately described, until now.
Dispelling previous misconceptions and revealing new areas for investigation, Magneto Luminous Chemical Vapor Deposition describes the key process of dielectric breakdown of gas molecules under the influence of a magnetic field. It emphasizes behavioral distinctions between molecular gasses that cause plasma polymerization (such as methane and trimethylsilane) and mono-atomic gases (e.g., helium and argon) when dealing with the dielectric breakdown of the gas phase under low pressure. The author also reveals his minimum perturbation theory of biocompatibility. This is based on the realization that nanofilms prepared using MLCVD have unique, stable interfacial characteristics necessary to achieve a surface that can be tolerated in various biological environments.
The author presents alternating views based on NASA's recent discovery that a magnetic field burst from the earth triggers the inception of the aurora borealis. Detailing similarities between this phenomenon and the inception of the magneto luminous gas phase described in this book, the author proposes that proof of the one occurrence could shed light on the other. Expanding on the author's previous works, this book introduces new discoveries, highlights the newfound errors of previous assumptions, and juxtaposes many cutting-edge alternative views and anomalies associated with the field.
Автор: Choy Название: Chemical Vapour Deposition (Cvd) ISBN: 1466597763 ISBN-13(EAN): 9781466597761 Издательство: Taylor&Francis Рейтинг: Цена: 178640.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This book provides an introduction to the use of Chemical Vapor Deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites.
Автор: Oviedo Oscar Alejandro, Reinaudi Luis, Garcia Silvana Название: Underpotential Deposition: From Fundamentals and Theory to Applications at the Nanoscale ISBN: 3319796194 ISBN-13(EAN): 9783319796192 Издательство: Springer Рейтинг: Цена: 93160.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: They also discuss real surface determinations and layer-by-layer growth of ultrathin films, as well as the very latest modeling approaches to UPD based on nanothermodynamics, statistical mechanics, molecular dynamics and Monte-Carlo simulations.
Автор: Kiyotaka Wasa Название: Handbook of Sputter Deposition Technology, ISBN: 1437734839 ISBN-13(EAN): 9781437734836 Издательство: Elsevier Science Рейтинг: Цена: 140360.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Faetures a team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. This book introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS.
Автор: Donald Smith Название: Thin-Film Deposition: Principles and Practice ISBN: 0070585024 ISBN-13(EAN): 9780070585027 Издательство: McGraw-Hill Рейтинг: Цена: 130410.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Offers a complete description of the theory and technology of thin film deposition. This book offers a broad perspective, and gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. It also includes a list of symbols and an extensive index.
Автор: Minier Jean-Pierre, Pozorski Jacek Название: Particles in Wall-Bounded Turbulent Flows: Deposition, Re-Suspension and Agglomeration ISBN: 331982385X ISBN-13(EAN): 9783319823850 Издательство: Springer Рейтинг: Цена: 93160.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: The book presents an up-to-date review of turbulent two-phase flows with the dispersed phase, with an emphasis on the dynamics in the near-wall region. Also included are models of particle dynamics in wall-bounded turbulent flows, and a description of particle surface interactions including muti-layer deposition and re-suspension.
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