Magneto Luminous Chemical Vapor Deposition, Yasuda Hirotsugu
Автор: Yasuda Название: Magneto Luminous Chemical Vapor Deposition ISBN: 1138072095 ISBN-13(EAN): 9781138072091 Издательство: Taylor&Francis Рейтинг: Цена: 107190.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание:
The magneto luminous chemical vapor deposition (MLCVD) method is the perfect example of the "front-end green process." It employs an entirely new process that expends the minimum amount of materials in gas phase, yields virtually no effluent, and therefore requires no environmental remediation. Unlike the "back-end green process," which calls for add-on processes to deal with effluent problems, the newer MLCVD approach is a completely different phenomenon that has never been adequately described, until now.
Dispelling previous misconceptions and revealing new areas for investigation, Magneto Luminous Chemical Vapor Deposition describes the key process of dielectric breakdown of gas molecules under the influence of a magnetic field. It emphasizes behavioral distinctions between molecular gasses that cause plasma polymerization (such as methane and trimethylsilane) and mono-atomic gases (e.g., helium and argon) when dealing with the dielectric breakdown of the gas phase under low pressure. The author also reveals his minimum perturbation theory of biocompatibility. This is based on the realization that nanofilms prepared using MLCVD have unique, stable interfacial characteristics necessary to achieve a surface that can be tolerated in various biological environments.
The author presents alternating views based on NASA's recent discovery that a magnetic field burst from the earth triggers the inception of the aurora borealis. Detailing similarities between this phenomenon and the inception of the magneto luminous gas phase described in this book, the author proposes that proof of the one occurrence could shed light on the other. Expanding on the author's previous works, this book introduces new discoveries, highlights the newfound errors of previous assumptions, and juxtaposes many cutting-edge alternative views and anomalies associated with the field.
Автор: Bchir Omar Название: Chemical Vapor Deposition of Thin Films for Diffusion Barrier Applications ISBN: 0530008319 ISBN-13(EAN): 9780530008318 Издательство: Неизвестно Рейтинг: Цена: 114030.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Abstract: PhD Dissertation: MOCVD of WNx Dissertation Discovery Company and University of Florida are dedicated to making scholarly works more discoverable and accessible throughout the world. This dissertation, "Chemical Vapor Deposition of Thin Films for Diffusion Barrier Applications" by Omar James Bchir, was obtained from University of Florida and is being sold with permission from the author. A digital copy of this work may also be found in the university's institutional repository, IR@UF. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation.
Автор: Bchir Omar Название: Chemical Vapor Deposition of Thin Films for Diffusion Barrier Applications ISBN: 0530008300 ISBN-13(EAN): 9780530008301 Издательство: Неизвестно Рейтинг: Цена: 80930.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Abstract: PhD Dissertation: MOCVD of WNx Dissertation Discovery Company and University of Florida are dedicated to making scholarly works more discoverable and accessible throughout the world. This dissertation, "Chemical Vapor Deposition of Thin Films for Diffusion Barrier Applications" by Omar James Bchir, was obtained from University of Florida and is being sold with permission from the author. A digital copy of this work may also be found in the university's institutional repository, IR@UF. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation.
Автор: Roland Yingjie Tay Название: Chemical Vapor Deposition Growth and Characterization of Two-Dimensional Hexagonal Boron Nitride ISBN: 9811342466 ISBN-13(EAN): 9789811342462 Издательство: Springer Рейтинг: Цена: 102480.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This thesis focuses on the growth of a new type of two-dimensional (2D) material known as hexagonal boron nitride (h-BN) using chemical vapor deposition (CVD). It also presents several significant breakthroughs in the authors’ understanding of the growth mechanism and development of new growth techniques, which are now well known in the field. Of particular importance is the pioneering work showing experimental proof that 2D crystals of h-BN can indeed be hexagonal in shape. This came as a major surprise to many working in the 2D field, as it had been generally assumed that hexagonal-shaped h-BN was impossible due to energy dynamics. Beyond growth, the thesis also reports on synthesis techniques that are geared toward commercial applications. Large-area aligned growth and up to an eightfold reduction in the cost of h-BN production are demonstrated. At present, all other 2D materials generally use h-BN as their dielectric layer and for encapsulation. As such, this thesis lays the cornerstone for using CVD 2D h-BN for this purpose.
Автор: Jeffrey B. Fortin; Toh-Ming Lu Название: Chemical Vapor Deposition Polymerization ISBN: 1441954139 ISBN-13(EAN): 9781441954138 Издательство: Springer Рейтинг: Цена: 113180.00 T Наличие на складе: Есть у поставщика Поставка под заказ.
The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology.
This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques.
Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications.
Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD)
Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles
Presents comparisons of different Cat-CVD methods which are usually not found in research papers
Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry.
Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.
Автор: Tay Название: Chemical Vapor Deposition Growth and Characterization of Two-Dimensional Hexagonal Boron Nitride ISBN: 981108808X ISBN-13(EAN): 9789811088087 Издательство: Springer Рейтинг: Цена: 102480.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This thesis focuses on the growth of a new type of two-dimensional (2D) material known as hexagonal boron nitride (h-BN) using chemical vapor deposition (CVD). This came as a major surprise to many working in the 2D field, as it had been generally assumed that hexagonal-shaped h-BN was impossible due to energy dynamics.
Автор: Donald M. Mattox Название: Handbook of Physical Vapor Deposition (PVD) Processing, ISBN: 0815520379 ISBN-13(EAN): 9780815520375 Издательство: Elsevier Science Рейтинг: Цена: 259390.00 T Наличие на складе: Нет в наличии. Описание: Explains various aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing.
Автор: Milani, Paolo Название: Cluster Beam Deposition Of Functional Nanomaterials And Devices,15 ISBN: 0081025157 ISBN-13(EAN): 9780081025154 Издательство: Elsevier Science Рейтинг: Цена: 190890.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание:
Cluster Beam Deposition of Functional Nanomaterials and Devices, Volume 15, provides up-to-date information on the CBD of novel nanomaterials and devices. The book offers an overview of gas phase synthesis in a range of nanoparticles, along with discussions on the development of several devices and applications. Applications include, but are not limited to catalysis, smart nanocomposites, nanoprobes, electronic devices, gas sensors and biosensors. This is an important reference source for materials scientists and engineers who want to learn more about this sustainable, innovative manufacturing technology.
Автор: Waqar Ahmed; Htet Sein; Mark J. Jackson; Christoph Название: Chemical Vapour Deposition of Diamond for Dental Tools and Burs ISBN: 3319006479 ISBN-13(EAN): 9783319006475 Издательство: Springer Рейтинг: Цена: 52240.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This volume presents chemical vapour deposition of diamond films for application in cutting tools, microdrills, dental burs and surgical tools. It examines various deposition techniques, discusses mechanisms of diamond growth and their impact on cutting tool life andperformance.
Автор: Xiu-Tian Yan; Yongdong Xu Название: Chemical Vapour Deposition ISBN: 1447125509 ISBN-13(EAN): 9781447125501 Издательство: Springer Рейтинг: Цена: 174130.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Chemical Vapour Deposition explores the design capabilities and applications of advanced materials. From physical fundamentals to the optimization of processing parameters, this volume presents the development and manufacture of high performance materials.
Автор: Theodor Schneller; Rainer Waser; Marija Kosec; Dav Название: Chemical Solution Deposition of Functional Oxide Thin Films ISBN: 3709119154 ISBN-13(EAN): 9783709119150 Издательство: Springer Рейтинг: Цена: 174130.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Chemical Solution Deposition (CSD) is a highly-flexible and inexpensive technique for the fabrication of functional oxide thin films. Featuring nearly 400 illustrations, this text covers all aspects of the technique.
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