Laser Metal Deposition Process of Metals, Alloys, and Composite Materials, Rasheedat Modupe Mahamood

Автор: Donald Smith
Название: Thin-Film Deposition: Principles and Practice
ISBN: 0070585024 ISBN-13(EAN): 9780070585027
Издательство: McGraw-Hill
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Цена: 130410.00 T
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Описание: Offers a complete description of the theory and technology of thin film deposition. This book offers a broad perspective, and gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. It also includes a list of symbols and an extensive index.

Автор: Doyle D. Knight
Название: Energy Deposition for High-Speed Flow Control
ISBN: 1107123054 ISBN-13(EAN): 9781107123052
Издательство: Cambridge Academ
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Цена: 174240.00 T
Наличие на складе: Невозможна поставка.
Описание: Presents a novel method for controlling high speed flows past aerodynamic shapes using energy deposition via direct current (DC), laser or microwave discharge. This research volume is perfect for those looking for a detailed description of these topics with examples of practical application in high-speed aerodynamics.

Автор: Kiyotaka Wasa
Название: Handbook of Sputter Deposition Technology,
ISBN: 1437734839 ISBN-13(EAN): 9781437734836
Издательство: Elsevier Science
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Цена: 140360.00 T
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Описание: Faetures a team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. This book introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS.

Автор: Rasheedat Modupe Mahamood
Название: Laser Metal Deposition Process of Metals, Alloys, and Composite Materials
ISBN: 3319649841 ISBN-13(EAN): 9783319649849
Издательство: Springer
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Цена: 149060.00 T
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Описание: This book highlights the industrial potential and explains the physics behind laser metal deposition (LMD) technology. It describes the laser metal deposition (LMD) process with the help of numerous diagrams and photographs of real-world process situations, ranging from the fabrication of parts to the repair of existing products, and includes case studies from current research in this field. Consumer demand is moving away from standardized products to customized ones, and to remain competitive manufacturers require manufacturing processes that are flexible and able to meet consumer demand at low cost and on schedule. Laser metal deposition (LMD) is a promising alternative manufacturing process in this context. This book enables researchers and professionals in industry gain a better understanding of the LMD process, which they can then use in real-world applications. It also helps spur on further innovations.

Автор: Choy
Название: Chemical Vapour Deposition (Cvd)
ISBN: 1466597763 ISBN-13(EAN): 9781466597761
Издательство: Taylor&Francis
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Цена: 178640.00 T
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Описание: This book provides an introduction to the use of Chemical Vapor Deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites.

Автор: Hani Henein; Volker Uhlenwinkel; Udo Fritsching
Название: Metal Sprays and Spray Deposition
ISBN: 3319526871 ISBN-13(EAN): 9783319526874
Издательство: Springer
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Цена: 158380.00 T
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Описание: This book describes and illustrates metal spray and spray deposition from the process engineering, metallurgical, and application viewpoints. The authors include step-by-step fundamental information for the metal spray process and detail current engineering developments and applications.

Автор: Xiu-Tian Yan; Yongdong Xu
Название: Chemical Vapour Deposition
ISBN: 1848828934 ISBN-13(EAN): 9781848828933
Издательство: Springer
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Цена: 174150.00 T
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Описание: Chemical Vapour Deposition explores the design capabilities and applications of advanced materials. From physical fundamentals to the optimization of processing parameters, this volume presents the development and manufacture of high performance materials.

Автор: Waqar Ahmed; Htet Sein; Mark J. Jackson; Christoph
Название: Chemical Vapour Deposition of Diamond for Dental Tools and Burs
ISBN: 3319006479 ISBN-13(EAN): 9783319006475
Издательство: Springer
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Цена: 52240.00 T
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Описание: This volume presents chemical vapour deposition of diamond films for application in cutting tools, microdrills, dental burs and surgical tools. It examines various deposition techniques, discusses mechanisms of diamond growth and their impact on cutting tool life andperformance.

Автор: Tay
Название: Chemical Vapor Deposition Growth and Characterization of Two-Dimensional Hexagonal Boron Nitride
ISBN: 981108808X ISBN-13(EAN): 9789811088087
Издательство: Springer
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Цена: 102480.00 T
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Описание: This thesis focuses on the growth of a new type of two-dimensional (2D) material known as hexagonal boron nitride (h-BN) using chemical vapor deposition (CVD). This came as a major surprise to many working in the 2D field, as it had been generally assumed that hexagonal-shaped h-BN was impossible due to energy dynamics.

Автор: Donald M. Mattox
Название: Handbook of Physical Vapor Deposition (PVD) Processing,
ISBN: 0815520379 ISBN-13(EAN): 9780815520375
Издательство: Elsevier Science
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Цена: 259390.00 T
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Описание: Explains various aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing.

Автор: Oscar Alejandro Oviedo; Luis Reinaudi; Silvana Gar
Название: Underpotential Deposition
ISBN: 3319243926 ISBN-13(EAN): 9783319243924
Издательство: Springer
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Цена: 121890.00 T
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Описание: They also discuss real surface determinations and layer-by-layer growth of ultrathin films, as well as the very latest modeling approaches to UPD based on nanothermodynamics, statistical mechanics, molecular dynamics and Monte-Carlo simulations.

Автор: Depla
Название: Reactive Sputter Deposition
ISBN: 3540766626 ISBN-13(EAN): 9783540766629
Издательство: Springer
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Цена: 214280.00 T
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Описание: In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process.