Advances in X-Ray/EUV Optics and Components XII, Christian Morawe, Ali Khounsary, Shunji Goto

Автор: Lahsen Assoufid, Haruhiko Ohashi, Anand Krishna Asundi
Название: Advances in Metrology for X-Ray and EUV Optics VII
ISBN: 1510612270 ISBN-13(EAN): 9781510612273
Издательство: Mare Nostrum (Eurospan)
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Описание: Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

Автор: Stephen L. O`Deill, Giovanni Pareschi
Название: Optics for EUV, X-Ray, and Gamma-Ray Astronomy VIII
ISBN: 1510612556 ISBN-13(EAN): 9781510612556
Издательство: Mare Nostrum (Eurospan)
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Описание: Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

Автор: Kenneth Goldberg
Название: Extreme Ultraviolet (EUV) Lithography IX
ISBN: 1510616586 ISBN-13(EAN): 9781510616585
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Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Ali Khounsary, Giovanni Pareschi
Название: Advances in Laboratory-based X-Ray Sources, Optics, and Applications VI
ISBN: 1510612319 ISBN-13(EAN): 9781510612310
Издательство: Mare Nostrum (Eurospan)
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Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Ali M. Khounsary, Shunji Goto, Christian Morawe
Название: Advances in X-Ray/EUV Optics and Components XI
ISBN: 1510603174 ISBN-13(EAN): 9781510603172
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Описание: Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

Автор: Shunji Goto, Christian Morawe, Ali Khounsary
Название: Advances in X-Ray/EUV Optics and Components XIII
ISBN: 1510620915 ISBN-13(EAN): 9781510620919
Издательство: Mare Nostrum (Eurospan)
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Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Lahsen Assoufid, Haruhiko Ohashi, Anand Krishna Asundi
Название: Advances in Metrology for X-Ray and EUV Optics VI
ISBN: 1510603158 ISBN-13(EAN): 9781510603158
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Описание: Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

Автор: Vivek Bakshi
Название: EUV Lithography
ISBN: 1510616780 ISBN-13(EAN): 9781510616783
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Описание: Extreme ultraviolet lithography (EUVL) is the principal lithography technology—beyond the current 193-nm-based optical lithography—aiming to manufacture computer chips, and recent progress has been made on several fronts: EUV light sources, scanners, optics, contamination control, masks and mask handling, and resists. This book covers the fundamental and latest status of all aspects of EUVL used in the field.Since 2008, when SPIE Press published the first edition of EUVL Lithography, much progress has taken place in the development of EUVL as the choice technology for next-generation lithography. In 2008, EUVL was a prime contender to replace 193-nm-based optical lithography in leading-edge computer chip making, but not everyone was convinced at that point. Switching from 193-nm to 13.5-nm wavelengths was a much bigger jump than the industry had attempted before. It brought several difficult challenges in all areas of lithography—light source, scanner, mask, mask handling, optics, optics metrology, resist, computation, materials, and optics contamination. These challenges have been effectively resolved, and several leading-edge chipmakers have announced dates, starting in 2018, for inserting EUVL into high-volume manufacturing.This comprehensive volume comprises contributions from the world’s leading EUVL researchers and provides the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. This book is intended for people involved in one or more aspects of EUVL, as well as for students, who will find this text equally valuable.

Автор: Shizhuo Yin, Ruyan Guo
Название: Photonic Fiber and Crystal Devices: Advances in Materials and Innovations in Device Applications XII
ISBN: 1510620818 ISBN-13(EAN): 9781510620810
Издательство: Mare Nostrum (Eurospan)
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Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Eric Panning
Название: Extreme Ultraviolet (EUV) Lithography VIII
ISBN: 1510607374 ISBN-13(EAN): 9781510607378
Издательство: Mare Nostrum (Eurospan)
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Цена: 142290.00 T
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Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Libor Juha, Sasa Bajt, Regina Soufli
Название: Damage to VUV, EUV, and X-ray Optics VI
ISBN: 1510609733 ISBN-13(EAN): 9781510609730
Издательство: Mare Nostrum (Eurospan)
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Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Rene Hudec, Ladislav Pina
Название: EUV and X-ray Optics: Synergy between Laboratory and Space V
ISBN: 1510609717 ISBN-13(EAN): 9781510609716
Издательство: Mare Nostrum (Eurospan)
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Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.