Chemistry of Atomic Layer Deposition, Barry Seбn Thomas
Автор: Milani, Paolo Название: Cluster Beam Deposition Of Functional Nanomaterials And Devices,15 ISBN: 0081025157 ISBN-13(EAN): 9780081025154 Издательство: Elsevier Science Рейтинг: Цена: 190890.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание:
Cluster Beam Deposition of Functional Nanomaterials and Devices, Volume 15, provides up-to-date information on the CBD of novel nanomaterials and devices. The book offers an overview of gas phase synthesis in a range of nanoparticles, along with discussions on the development of several devices and applications. Applications include, but are not limited to catalysis, smart nanocomposites, nanoprobes, electronic devices, gas sensors and biosensors. This is an important reference source for materials scientists and engineers who want to learn more about this sustainable, innovative manufacturing technology.
Автор: Cheol Seong Hwang Название: Atomic Layer Deposition for Semiconductors ISBN: 1489979433 ISBN-13(EAN): 9781489979438 Издательство: Springer Рейтинг: Цена: 87060.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Автор: Cheol Seong Hwang Название: Atomic Layer Deposition for Semiconductors ISBN: 1461480531 ISBN-13(EAN): 9781461480532 Издательство: Springer Рейтинг: Цена: 104480.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines.
Автор: Yasuda Название: Magneto Luminous Chemical Vapor Deposition ISBN: 1138072095 ISBN-13(EAN): 9781138072091 Издательство: Taylor&Francis Рейтинг: Цена: 107190.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание:
The magneto luminous chemical vapor deposition (MLCVD) method is the perfect example of the "front-end green process." It employs an entirely new process that expends the minimum amount of materials in gas phase, yields virtually no effluent, and therefore requires no environmental remediation. Unlike the "back-end green process," which calls for add-on processes to deal with effluent problems, the newer MLCVD approach is a completely different phenomenon that has never been adequately described, until now.
Dispelling previous misconceptions and revealing new areas for investigation, Magneto Luminous Chemical Vapor Deposition describes the key process of dielectric breakdown of gas molecules under the influence of a magnetic field. It emphasizes behavioral distinctions between molecular gasses that cause plasma polymerization (such as methane and trimethylsilane) and mono-atomic gases (e.g., helium and argon) when dealing with the dielectric breakdown of the gas phase under low pressure. The author also reveals his minimum perturbation theory of biocompatibility. This is based on the realization that nanofilms prepared using MLCVD have unique, stable interfacial characteristics necessary to achieve a surface that can be tolerated in various biological environments.
The author presents alternating views based on NASA's recent discovery that a magnetic field burst from the earth triggers the inception of the aurora borealis. Detailing similarities between this phenomenon and the inception of the magneto luminous gas phase described in this book, the author proposes that proof of the one occurrence could shed light on the other. Expanding on the author's previous works, this book introduces new discoveries, highlights the newfound errors of previous assumptions, and juxtaposes many cutting-edge alternative views and anomalies associated with the field.
Автор: Choy Название: Chemical Vapour Deposition (Cvd) ISBN: 1466597763 ISBN-13(EAN): 9781466597761 Издательство: Taylor&Francis Рейтинг: Цена: 178640.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This book provides an introduction to the use of Chemical Vapor Deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites.
The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology.
This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques.
Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications.
Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD)
Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles
Presents comparisons of different Cat-CVD methods which are usually not found in research papers
Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry.
Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.
Автор: Eve A. Milne Название: Layer-By-Layer Deposition: Development and Applications ISBN: 1536169838 ISBN-13(EAN): 9781536169836 Издательство: Nova Science Рейтинг: Цена: 182680.00 T Наличие на складе: Невозможна поставка. Описание: Layer-by-layer self-assembly is the most widely used strategy for the production of functional surfaces with tailored structures and chemical, biological, optical and electrical properties. Layer-by-layer approaches allow for the loading of bioactive molecules for tissue scaffolds, cardiovascular devices, implants, wound healing dressing, bone grafts, biosensors, drug delivery, and release systems. Layer-By-Layer Deposition: Development and Applications also examines the physico-chemical bases underlying the fabrication of materials by the layer-by-layer method. Understanding the forces involved in the control of the assembly process is essential for the fabrication of materials with controlled properties, and structures. Following this, the main principles and latest strategies of functionalized films, diamond core-shell structures, and graphene/graphene oxide nanocomposites by layer-by-layer self-assembly technology are extensively reviewed in detail, and these composites have been applied in the fields of biology, catalysis, and dye degradation. The authors study the layer-by-layer growth of quasiperiodic structures that are mathematical models of quasicrystals. This study is based on the concept of model sets proposed by Moody and generalizing the well-known "cut-and-project" method. This compilation also reviews the current state of the art uses of the layer-by-layer strategy for providing natural and synthetic textile materials with flame retardant properties, reviewing and discussing the current advances. The penultimate study focuses on how nisin peptides can be entrapped and released, creating an antibacterial food-contacting textile membrane. Biocatalytic membranes can be fabricated using entrapped enzymes. Lastly, the different issues of multilayer emulsions with flaxseed and chia seed oil as omega-3 sources will be discussed, including their formation, composition, stability, characterization, and application.
Автор: Wilhelm A.M. Kulisch Название: Deposition of Diamond-Like Superhard Materials ISBN: 366215627X ISBN-13(EAN): 9783662156278 Издательство: Springer Рейтинг: Цена: 93160.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This book deals with the deposition of a certain class of materials, namely the diamond-like superhard materials, in the form of thin films. Starting from concepts used to improve the hardness of a material, it is shown that the intrinsic hardness is highest for materials with low bond lengths, high coordination numbers, and low ionicities.
Автор: Donald M. Mattox Название: Handbook of Physical Vapor Deposition (PVD) Processing, ISBN: 0815520379 ISBN-13(EAN): 9780815520375 Издательство: Elsevier Science Рейтинг: Цена: 259390.00 T Наличие на складе: Поставка под заказ. Описание: Explains various aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing.
Автор: Xiu-Tian Yan; Yongdong Xu Название: Chemical Vapour Deposition ISBN: 1848828934 ISBN-13(EAN): 9781848828933 Издательство: Springer Рейтинг: Цена: 174150.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Chemical Vapour Deposition explores the design capabilities and applications of advanced materials. From physical fundamentals to the optimization of processing parameters, this volume presents the development and manufacture of high performance materials.
Автор: Rosa C?rdoba Castillo Название: Functional Nanostructures Fabricated by Focused Electron/Ion Beam Induced Deposition ISBN: 3319375539 ISBN-13(EAN): 9783319375533 Издательство: Springer Рейтинг: Цена: 87060.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This book offers a detailed study of functional nanostructures (ferromagnetic, superconducting, metallic and semiconducting) fabricated by focused electron/ion beam induced deposition techniques.
Автор: Jeffrey B. Fortin; Toh-Ming Lu Название: Chemical Vapor Deposition Polymerization ISBN: 1441954139 ISBN-13(EAN): 9781441954138 Издательство: Springer Рейтинг: Цена: 113180.00 T Наличие на складе: Есть у поставщика Поставка под заказ.
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