Layer-By-Layer Deposition: Development and Applications, Eve A. Milne
Автор: Donald Smith Название: Thin-Film Deposition: Principles and Practice ISBN: 0070585024 ISBN-13(EAN): 9780070585027 Издательство: McGraw-Hill Рейтинг: Цена: 130410.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Offers a complete description of the theory and technology of thin film deposition. This book offers a broad perspective, and gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. It also includes a list of symbols and an extensive index.
Автор: Cordoba Castillo, Rosa Название: Functional nanostructures fabricated by focused electron/ion beam induced deposition ISBN: 3319020803 ISBN-13(EAN): 9783319020808 Издательство: Springer Рейтинг: Цена: 104480.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This book offers a detailed study of functional nanostructures (ferromagnetic, superconducting, metallic and semiconducting) fabricated by focused electron/ion beam induced deposition techniques.
Автор: Wilhelm A.M. Kulisch Название: Deposition of Diamond-Like Superhard Materials ISBN: 366215627X ISBN-13(EAN): 9783662156278 Издательство: Springer Рейтинг: Цена: 93160.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This book deals with the deposition of a certain class of materials, namely the diamond-like superhard materials, in the form of thin films. Starting from concepts used to improve the hardness of a material, it is shown that the intrinsic hardness is highest for materials with low bond lengths, high coordination numbers, and low ionicities.
Автор: Hani Henein; Volker Uhlenwinkel; Udo Fritsching Название: Metal Sprays and Spray Deposition ISBN: 3319526871 ISBN-13(EAN): 9783319526874 Издательство: Springer Рейтинг: Цена: 158380.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This book describes and illustrates metal spray and spray deposition from the process engineering, metallurgical, and application viewpoints. The authors include step-by-step fundamental information for the metal spray process and detail current engineering developments and applications.
The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology.
This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques.
Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications.
Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD)
Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles
Presents comparisons of different Cat-CVD methods which are usually not found in research papers
Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry.
Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.
Автор: Oscar Alejandro Oviedo; Luis Reinaudi; Silvana Gar Название: Underpotential Deposition ISBN: 3319243926 ISBN-13(EAN): 9783319243924 Издательство: Springer Рейтинг: Цена: 121890.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: They also discuss real surface determinations and layer-by-layer growth of ultrathin films, as well as the very latest modeling approaches to UPD based on nanothermodynamics, statistical mechanics, molecular dynamics and Monte-Carlo simulations.
Автор: Choy Название: Chemical Vapour Deposition (Cvd) ISBN: 1466597763 ISBN-13(EAN): 9781466597761 Издательство: Taylor&Francis Рейтинг: Цена: 178640.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This book provides an introduction to the use of Chemical Vapor Deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites.
Автор: Kiyotaka Wasa Название: Handbook of Sputter Deposition Technology, ISBN: 1437734839 ISBN-13(EAN): 9781437734836 Издательство: Elsevier Science Рейтинг: Цена: 140360.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Faetures a team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. This book introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS.
Автор: K. Bruce Winterbon Название: Ion Implantation Range and Energy Deposition Distributions ISBN: 1475756143 ISBN-13(EAN): 9781475756142 Издательство: Springer Рейтинг: Цена: 93160.00 T Наличие на складе: Есть у поставщика Поставка под заказ.
Автор: Minier Название: Particles in Wall-Bounded Turbulent Flows: Deposition, Re-Suspension and Agglomeration ISBN: 3319415662 ISBN-13(EAN): 9783319415666 Издательство: Springer Рейтинг: Цена: 139750.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: The book presents an up-to-date review of turbulent two-phase flows with the dispersed phase, with an emphasis on the dynamics in the near-wall region. Also included are models of particle dynamics in wall-bounded turbulent flows, and a description of particle surface interactions including muti-layer deposition and re-suspension.
Автор: Jeffrey B. Fortin; Toh-Ming Lu Название: Chemical Vapor Deposition Polymerization ISBN: 1441954139 ISBN-13(EAN): 9781441954138 Издательство: Springer Рейтинг: Цена: 113180.00 T Наличие на складе: Есть у поставщика Поставка под заказ.
Автор: Xiu-Tian Yan; Yongdong Xu Название: Chemical Vapour Deposition ISBN: 1848828934 ISBN-13(EAN): 9781848828933 Издательство: Springer Рейтинг: Цена: 174150.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Chemical Vapour Deposition explores the design capabilities and applications of advanced materials. From physical fundamentals to the optimization of processing parameters, this volume presents the development and manufacture of high performance materials.
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