Magneto Luminous Chemical Vapor Deposition, Yasuda
Автор: Donald Smith Название: Thin-Film Deposition: Principles and Practice ISBN: 0070585024 ISBN-13(EAN): 9780070585027 Издательство: McGraw-Hill Рейтинг: Цена: 130410.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Offers a complete description of the theory and technology of thin film deposition. This book offers a broad perspective, and gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. It also includes a list of symbols and an extensive index.
Автор: Jeffrey B. Fortin; Toh-Ming Lu Название: Chemical Vapor Deposition Polymerization ISBN: 1441954139 ISBN-13(EAN): 9781441954138 Издательство: Springer Рейтинг: Цена: 113180.00 T Наличие на складе: Есть у поставщика Поставка под заказ.
Автор: Choy Название: Chemical Vapour Deposition (Cvd) ISBN: 1466597763 ISBN-13(EAN): 9781466597761 Издательство: Taylor&Francis Рейтинг: Цена: 178640.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This book provides an introduction to the use of Chemical Vapor Deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites.
Автор: Waqar Ahmed; Htet Sein; Mark J. Jackson; Christoph Название: Chemical Vapour Deposition of Diamond for Dental Tools and Burs ISBN: 3319006479 ISBN-13(EAN): 9783319006475 Издательство: Springer Рейтинг: Цена: 52240.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This volume presents chemical vapour deposition of diamond films for application in cutting tools, microdrills, dental burs and surgical tools. It examines various deposition techniques, discusses mechanisms of diamond growth and their impact on cutting tool life andperformance.
The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology.
This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques.
Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications.
Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD)
Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles
Presents comparisons of different Cat-CVD methods which are usually not found in research papers
Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry.
Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.
Автор: Tay Название: Chemical Vapor Deposition Growth and Characterization of Two-Dimensional Hexagonal Boron Nitride ISBN: 981108808X ISBN-13(EAN): 9789811088087 Издательство: Springer Рейтинг: Цена: 102480.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This thesis focuses on the growth of a new type of two-dimensional (2D) material known as hexagonal boron nitride (h-BN) using chemical vapor deposition (CVD). This came as a major surprise to many working in the 2D field, as it had been generally assumed that hexagonal-shaped h-BN was impossible due to energy dynamics.
Автор: Donald M. Mattox Название: Handbook of Physical Vapor Deposition (PVD) Processing, ISBN: 0815520379 ISBN-13(EAN): 9780815520375 Издательство: Elsevier Science Рейтинг: Цена: 259390.00 T Наличие на складе: Поставка под заказ. Описание: Explains various aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing.
Автор: Theodor Schneller; Rainer Waser; Marija Kosec; Dav Название: Chemical Solution Deposition of Functional Oxide Thin Films ISBN: 3709119154 ISBN-13(EAN): 9783709119150 Издательство: Springer Рейтинг: Цена: 174130.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Chemical Solution Deposition (CSD) is a highly-flexible and inexpensive technique for the fabrication of functional oxide thin films. Featuring nearly 400 illustrations, this text covers all aspects of the technique.
Автор: Xiu-Tian Yan; Yongdong Xu Название: Chemical Vapour Deposition ISBN: 1447125509 ISBN-13(EAN): 9781447125501 Издательство: Springer Рейтинг: Цена: 174130.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Chemical Vapour Deposition explores the design capabilities and applications of advanced materials. From physical fundamentals to the optimization of processing parameters, this volume presents the development and manufacture of high performance materials.
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