Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology, Kiwamu Takehisa

Автор: Uwe F.W. Behringer, Jo Finders
Название: 33rd European Mask and Lithography Conference
ISBN: 1510613560 ISBN-13(EAN): 9781510613560
Издательство: Mare Nostrum (Eurospan)
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Цена: 71150.00 T
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Описание: Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

Автор: Kiwamu Takehisa
Название: Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
ISBN: 1510622012 ISBN-13(EAN): 9781510622012
Издательство: Mare Nostrum (Eurospan)
Рейтинг:
Цена: 71150.00 T
Наличие на складе: Невозможна поставка.
Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Uwe Behringer, Jo Finders
Название: 34th European Mask and Lithography Conference
ISBN: 1510621210 ISBN-13(EAN): 9781510621213
Издательство: Mare Nostrum (Eurospan)
Рейтинг:
Цена: 71150.00 T
Наличие на складе: Невозможна поставка.
Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Peter Buck, Emily Gallagher
Название: Photomask Technology
ISBN: 1510613765 ISBN-13(EAN): 9781510613768
Издательство: Mare Nostrum (Eurospan)
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Цена: 121970.00 T
Наличие на складе: Невозможна поставка.
Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Emily Gallagher
Название: Photomask Technology 2018
ISBN: 1510622152 ISBN-13(EAN): 9781510622159
Издательство: Mare Nostrum (Eurospan)
Рейтинг:
Цена: 109030.00 T
Наличие на складе: Невозможна поставка.
Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.