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Photomask Technology 2018, Emily Gallagher


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Автор: Emily Gallagher
Название:  Photomask Technology 2018
ISBN: 9781510622159
Издательство: Mare Nostrum (Eurospan)
Классификация:
ISBN-10: 1510622152
Обложка/Формат: Paperback
Страницы: 314
Вес: 0.00 кг.
Дата издания: 28.02.2019
Серия: Proceedings of spie
Язык: English
Размер: H 279 X W 216
Читательская аудитория: Professional and scholarly
Ключевые слова: Applied optics
Рейтинг:
Поставляется из: Англии
Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Kiwamu Takehisa
Название: Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
ISBN: 1510622012 ISBN-13(EAN): 9781510622012
Издательство: Mare Nostrum (Eurospan)
Рейтинг:
Цена: 71150.00 T
Наличие на складе: Невозможна поставка.
Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Robert Nishikawa, Frank Samuelson
Название: Medical Imaging 2018: Image Perception, Observer Performance, and Technology Assessment
ISBN: 1510616438 ISBN-13(EAN): 9781510616431
Издательство: Mare Nostrum (Eurospan)
Рейтинг:
Цена: 91470.00 T
Наличие на складе: Невозможна поставка.
Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Brian J. Wong, Justus Ilgner, Max Witjes
Название: Optical Imaging, Therapeutics, and Advanced Technology in Head and Neck Surgery and Otolaryngology 2018
ISBN: 1510614230 ISBN-13(EAN): 9781510614239
Издательство: Mare Nostrum (Eurospan)
Рейтинг:
Цена: 75770.00 T
Наличие на складе: Невозможна поставка.
Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Jan Jabczy?ski, Ryszard Romaniuk
Название: Laser Technology 2018: Progress and Applications of Lasers
ISBN: 1510626034 ISBN-13(EAN): 9781510626034
Издательство: Mare Nostrum (Eurospan)
Рейтинг:
Цена: 83160.00 T
Наличие на складе: Невозможна поставка.
Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Peter Buck, Emily Gallagher
Название: Photomask Technology
ISBN: 1510613765 ISBN-13(EAN): 9781510613768
Издательство: Mare Nostrum (Eurospan)
Рейтинг:
Цена: 121970.00 T
Наличие на складе: Невозможна поставка.
Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Kiwamu Takehisa
Название: Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
ISBN: 1510613897 ISBN-13(EAN): 9781510613898
Издательство: Mare Nostrum (Eurospan)
Рейтинг:
Цена: 81310.00 T
Наличие на складе: Невозможна поставка.
Описание: Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.


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