Photomask Technology, Peter Buck, Emily Gallagher

Автор: Thomas Faure
Название: Photomask Technology 2013
ISBN: 081949545X ISBN-13(EAN): 9780819495457
Издательство: Mare Nostrum (Eurospan)
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Цена: 162630.00 T
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Описание: Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

Автор: Nobuyuki Yoshioka
Название: Photomask Japan 2015: Photomask and Next-Generation Lithography Mask Technology XXII
ISBN: 1628418710 ISBN-13(EAN): 9781628418712
Издательство: Mare Nostrum (Eurospan)
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Цена: 91470.00 T
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Описание: Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

Автор: Naoya Hayashi
Название: Photomask Technology 2015
ISBN: 1628418451 ISBN-13(EAN): 9781628418453
Издательство: Mare Nostrum (Eurospan)
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Цена: 132130.00 T
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Описание: Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

Автор: Nobuyuki Yoshioka
Название: Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology
ISBN: 1510603727 ISBN-13(EAN): 9781510603721
Издательство: Mare Nostrum (Eurospan)
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Цена: 71150.00 T
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Описание: Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

Автор: Kiwamu Takehisa
Название: Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
ISBN: 1510613897 ISBN-13(EAN): 9781510613898
Издательство: Mare Nostrum (Eurospan)
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Цена: 81310.00 T
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Описание: Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

Автор: Emily Gallagher
Название: Photomask Technology 2018
ISBN: 1510622152 ISBN-13(EAN): 9781510622159
Издательство: Mare Nostrum (Eurospan)
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Цена: 109030.00 T
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Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Kiwamu Takehisa
Название: Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
ISBN: 1510622012 ISBN-13(EAN): 9781510622012
Издательство: Mare Nostrum (Eurospan)
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Цена: 71150.00 T
Наличие на складе: Невозможна поставка.
Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.