International Conference on Extreme Ultraviolet Lithography 2018, Kurt Ronse, Eric Hendrickx, Patrick Naulleau, Paolo Gargini, Toshiro Itani

Автор: Michael Kneissl; Jens Rass
Название: III-Nitride Ultraviolet Emitters
ISBN: 3319240986 ISBN-13(EAN): 9783319240985
Издательство: Springer
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Цена: 139310.00 T
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Описание: This book provides a comprehensive overview of the state-of-the-art in group III-nitride based ultraviolet LED and laser technologies, covering different substrate approaches, a review of optical, electronic and structural properties of InAlGaN materials as well as various optoelectronic components.

Автор: Kenneth Goldberg
Название: Extreme Ultraviolet (EUV) Lithography IX
ISBN: 1510616586 ISBN-13(EAN): 9781510616585
Издательство: Mare Nostrum (Eurospan)
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Цена: 142290.00 T
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Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Uwe F.W. Behringer, Jo Finders
Название: 33rd European Mask and Lithography Conference
ISBN: 1510613560 ISBN-13(EAN): 9781510613560
Издательство: Mare Nostrum (Eurospan)
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Цена: 71150.00 T
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Описание: Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

Автор: Jan-Willem den Herder, Kazuhiro Nakazawa
Название: Space Telescopes and Instrumentation 2018: Ultraviolet to Gamma Ray
ISBN: 1510619518 ISBN-13(EAN): 9781510619517
Издательство: Mare Nostrum (Eurospan)
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Цена: 294750.00 T
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Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Kiwamu Takehisa
Название: Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
ISBN: 1510622012 ISBN-13(EAN): 9781510622012
Издательство: Mare Nostrum (Eurospan)
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Цена: 71150.00 T
Наличие на складе: Невозможна поставка.
Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Kiwamu Takehisa
Название: Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
ISBN: 1510613897 ISBN-13(EAN): 9781510613898
Издательство: Mare Nostrum (Eurospan)
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Цена: 81310.00 T
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Описание: Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

Автор: Eric Panning
Название: Extreme Ultraviolet (EUV) Lithography VIII
ISBN: 1510607374 ISBN-13(EAN): 9781510607378
Издательство: Mare Nostrum (Eurospan)
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Цена: 142290.00 T
Наличие на складе: Невозможна поставка.
Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Uwe Behringer, Jo Finders
Название: 34th European Mask and Lithography Conference
ISBN: 1510621210 ISBN-13(EAN): 9781510621213
Издательство: Mare Nostrum (Eurospan)
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Цена: 71150.00 T
Наличие на складе: Невозможна поставка.
Описание: Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Автор: Vivek Bakshi
Название: EUV Lithography
ISBN: 1510616780 ISBN-13(EAN): 9781510616783
Издательство: Mare Nostrum (Eurospan)
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Цена: 100320.00 T
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Описание: Extreme ultraviolet lithography (EUVL) is the principal lithography technology—beyond the current 193-nm-based optical lithography—aiming to manufacture computer chips, and recent progress has been made on several fronts: EUV light sources, scanners, optics, contamination control, masks and mask handling, and resists. This book covers the fundamental and latest status of all aspects of EUVL used in the field.Since 2008, when SPIE Press published the first edition of EUVL Lithography, much progress has taken place in the development of EUVL as the choice technology for next-generation lithography. In 2008, EUVL was a prime contender to replace 193-nm-based optical lithography in leading-edge computer chip making, but not everyone was convinced at that point. Switching from 193-nm to 13.5-nm wavelengths was a much bigger jump than the industry had attempted before. It brought several difficult challenges in all areas of lithography—light source, scanner, mask, mask handling, optics, optics metrology, resist, computation, materials, and optics contamination. These challenges have been effectively resolved, and several leading-edge chipmakers have announced dates, starting in 2018, for inserting EUVL into high-volume manufacturing.This comprehensive volume comprises contributions from the world’s leading EUVL researchers and provides the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. This book is intended for people involved in one or more aspects of EUVL, as well as for students, who will find this text equally valuable.

Автор: Attwood
Название: X-Rays and Extreme Ultraviolet Radiation
ISBN: 1107062896 ISBN-13(EAN): 9781107062894
Издательство: Cambridge Academ
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Цена: 72870.00 T
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Описание: Master the physics and understand the current applications of modern X-ray and EUV sources with this comprehensive yet mathematically accessible guide. This second edition includes entirely new material on free electron lasers, laser high harmonic generation, X-ray and EUV optics, nanoscale imaging, and femtosecond and attosecond techniques.