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Catalytic Chemical Vapor Deposition: Technology and Applications of Cat–CVD, Hideki Matsumura, Hironobu Umemoto, Karen K. Gleas


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Автор: Hideki Matsumura, Hironobu Umemoto, Karen K. Gleas
Название:  Catalytic Chemical Vapor Deposition: Technology and Applications of Cat–CVD
ISBN: 9783527345236
Издательство: Wiley
Классификация:




ISBN-10: 352734523X
Обложка/Формат: Hardback
Страницы: 440
Вес: 0.99 кг.
Дата издания: 17.04.2019
Серия: Chemistry
Язык: English
Размер: 249 x 178 x 25
Читательская аудитория: Professional & vocational
Ключевые слова: Chemical engineering,Mechanical engineering & materials,Chemistry
Основная тема: Chemistry,Chemical engineering,Mechanical engineering & materials
Подзаголовок: Technology and applications of cat-cvd
Ссылка на Издательство: Link
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Поставляется из: Англии
Описание:

The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology.

This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques.

Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications.

  • Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD)
  • Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles
  • Presents comparisons of different Cat-CVD methods which are usually not found in research papers
  • Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry.

Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.



Magneto Luminous Chemical Vapor Deposition

Автор: Yasuda
Название: Magneto Luminous Chemical Vapor Deposition
ISBN: 1138072095 ISBN-13(EAN): 9781138072091
Издательство: Taylor&Francis
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Цена: 107190.00 T
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Описание:

The magneto luminous chemical vapor deposition (MLCVD) method is the perfect example of the "front-end green process." It employs an entirely new process that expends the minimum amount of materials in gas phase, yields virtually no effluent, and therefore requires no environmental remediation. Unlike the "back-end green process," which calls for add-on processes to deal with effluent problems, the newer MLCVD approach is a completely different phenomenon that has never been adequately described, until now.

Dispelling previous misconceptions and revealing new areas for investigation, Magneto Luminous Chemical Vapor Deposition describes the key process of dielectric breakdown of gas molecules under the influence of a magnetic field. It emphasizes behavioral distinctions between molecular gasses that cause plasma polymerization (such as methane and trimethylsilane) and mono-atomic gases (e.g., helium and argon) when dealing with the dielectric breakdown of the gas phase under low pressure. The author also reveals his minimum perturbation theory of biocompatibility. This is based on the realization that nanofilms prepared using MLCVD have unique, stable interfacial characteristics necessary to achieve a surface that can be tolerated in various biological environments.

The author presents alternating views based on NASA's recent discovery that a magnetic field burst from the earth triggers the inception of the aurora borealis. Detailing similarities between this phenomenon and the inception of the magneto luminous gas phase described in this book, the author proposes that proof of the one occurrence could shed light on the other. Expanding on the author's previous works, this book introduces new discoveries, highlights the newfound errors of previous assumptions, and juxtaposes many cutting-edge alternative views and anomalies associated with the field.


Chemical Vapor Deposition Polymerization

Автор: Jeffrey B. Fortin; Toh-Ming Lu
Название: Chemical Vapor Deposition Polymerization
ISBN: 1441954139 ISBN-13(EAN): 9781441954138
Издательство: Springer
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Цена: 113180.00 T
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Chemical Vapor Deposition Growth and Characterization of Two-Dimensional Hexagonal Boron Nitride

Автор: Tay
Название: Chemical Vapor Deposition Growth and Characterization of Two-Dimensional Hexagonal Boron Nitride
ISBN: 981108808X ISBN-13(EAN): 9789811088087
Издательство: Springer
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Цена: 102480.00 T
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Описание: This thesis focuses on the growth of a new type of two-dimensional (2D) material known as hexagonal boron nitride (h-BN) using chemical vapor deposition (CVD). This came as a major surprise to many working in the 2D field, as it had been generally assumed that hexagonal-shaped h-BN was impossible due to energy dynamics.

Chemical Vapour Deposition (Cvd)

Автор: Choy
Название: Chemical Vapour Deposition (Cvd)
ISBN: 1466597763 ISBN-13(EAN): 9781466597761
Издательство: Taylor&Francis
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Цена: 178640.00 T
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Описание: This book provides an introduction to the use of Chemical Vapor Deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites.

Handbook of Physical Vapor Deposition (PVD) Processing,

Автор: Donald M. Mattox
Название: Handbook of Physical Vapor Deposition (PVD) Processing,
ISBN: 0815520379 ISBN-13(EAN): 9780815520375
Издательство: Elsevier Science
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Цена: 259390.00 T
Наличие на складе: Поставка под заказ.
Описание: Explains various aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing.

Nanoparticle Design and Characterization for Catalytic Applications in Sustainable Chemistry

Автор: Luque Rafael, Prinsen Pepijn
Название: Nanoparticle Design and Characterization for Catalytic Applications in Sustainable Chemistry
ISBN: 1788014901 ISBN-13(EAN): 9781788014908
Издательство: Royal Society of Chemistry
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Цена: 209790.00 T
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Описание: This book presents an introduction to the preparation and characterisation of nanomaterials and their design for specific catalytic applications.

Thin-Film Deposition: Principles and Practice

Автор: Donald Smith
Название: Thin-Film Deposition: Principles and Practice
ISBN: 0070585024 ISBN-13(EAN): 9780070585027
Издательство: McGraw-Hill
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Цена: 130410.00 T
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Описание: Offers a complete description of the theory and technology of thin film deposition. This book offers a broad perspective, and gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. It also includes a list of symbols and an extensive index.

Handbook of Sputter Deposition Technology,

Автор: Kiyotaka Wasa
Название: Handbook of Sputter Deposition Technology,
ISBN: 1437734839 ISBN-13(EAN): 9781437734836
Издательство: Elsevier Science
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Цена: 140360.00 T
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Описание: Faetures a team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. This book introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS.

Energy Deposition for High-Speed Flow Control

Автор: Doyle D. Knight
Название: Energy Deposition for High-Speed Flow Control
ISBN: 1107123054 ISBN-13(EAN): 9781107123052
Издательство: Cambridge Academ
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Цена: 174240.00 T
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Описание: Presents a novel method for controlling high speed flows past aerodynamic shapes using energy deposition via direct current (DC), laser or microwave discharge. This research volume is perfect for those looking for a detailed description of these topics with examples of practical application in high-speed aerodynamics.


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