Physical Design and Mask Synthesis for Directed Self-Assembly Lithography, Seongbo Shim; Youngsoo Shin

Автор: Jingsong Wei
Название: Laser Heat-Mode Lithography
ISBN: 9811509425 ISBN-13(EAN): 9789811509421
Издательство: Springer
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Цена: 93160.00 T
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Описание: This book provides a systematic description and analysis of laser heat-mode lithography, addressing the basic principles, lithography system, manipulation of feature size, grayscale lithography, resist thin films, and pattern transfer, while also presenting typical experimental results and applications. It introduces laser heat-mode lithography, where the resist thin films are essentially an opto-thermal response to the laser beam with changeable wavelength and are not sensitive to laser wavelength. Laser heat-mode lithography techniques greatly simplify production procedures because they require neither a particular light source nor a particular environment; further, there are no pre-baking and post-baking steps required for organic photoresists. The pattern feature size can be either larger or smaller than the laser spot by adjusting the writing strategy. The lithographic feature size can also be arbitrarily tuned from nanoscale to micrometer without changing the laser spot size. Lastly, the line edge roughness can be controlled at a very low value because the etching process is a process of breaking bonds among atoms. The book offers an invaluable reference guide for all advanced undergraduates, graduate students, researchers and engineers working in the fields of nanofabrication, lithography techniques and systems, phase change materials, etc.

Автор: Bei Yu; David Z. Pan
Название: Design for Manufacturability with Advanced Lithography
ISBN: 3319373935 ISBN-13(EAN): 9783319373935
Издательство: Springer
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Цена: 74530.00 T
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Описание: This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).

Автор: Wayne M. Moreau
Название: Semiconductor Lithography
ISBN: 1461282284 ISBN-13(EAN): 9781461282280
Издательство: Springer
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Цена: 113190.00 T
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Описание: In fabricating a semiconductor device such as a transistor, a series of hot processes consisting of vacuum film deposition, oxidations, and dopant implantation are all patterned into microscopic circuits by the wet processes of lithography.

Автор: Uzodinma Okoroanyanwu
Название: Molecular Theory of Lithography
ISBN: 1628415517 ISBN-13(EAN): 9781628415513
Издательство: Mare Nostrum (Eurospan)
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Цена: 76910.00 T
Наличие на складе: Невозможна поставка.
Описание: This book is a unified exposition of the molecular theory that underlies lithographic imaging. It explains with physical-chemical theories the molecular-level interactions involved in lithographic imaging. It also provides the theoretical basis for the main unit operations of the advanced lithographic process, as well as for advanced lithographic imaging mechanisms, including photochemical and radiochemical, imprint, and directed block copolymer self-assembly imaging mechanisms. The book is intended for student and professionals whose knowledge of lithography extends to the chemistry and physics underlying its various forms. A familiarity with chemical kinetics, thermodynamics, statistical mechanics, and quantum mechanics will be helpful, as will be familiarity with elementary concepts in physics such as energy, force, electrostatics, electrodynamics, and optics.

Автор: Mack
Название: Fundamental Principles of Optical Lithography: The Science of Microfabrication
ISBN: 0470727306 ISBN-13(EAN): 9780470727300
Издательство: Wiley
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Цена: 61190.00 T
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Описание: Fundamental Principles of Optical Lithography: The Science of Microfabrication presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. This sole-authored text includes optional computer simulation exercises as well as problems at the end of each chapter.

Автор: Weimin Zhou
Название: Nanoimprint Lithography: An Enabling Process for Nanofabrication
ISBN: 3662510863 ISBN-13(EAN): 9783662510865
Издательство: Springer
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Цена: 104480.00 T
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Описание: With hundreds of explanatory figures and tables, this volume deals with the latest achievements in hot areas such as nanofabrication and nanotechnology, with multi-disciplinary results on promising low-cost, high-throughput nanostructure manufacturing methods.

Автор: Weimin Zhou
Название: Nanoimprint Lithography: An Enabling Process for Nanofabrication
ISBN: 3642344275 ISBN-13(EAN): 9783642344275
Издательство: Springer
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Цена: 130610.00 T
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Описание: With hundreds of explanatory figures and tables, this volume deals with the latest achievements in hot areas such as nanofabrication and nanotechnology, with multi-disciplinary results on promising low-cost, high-throughput nanostructure manufacturing methods.

Автор: Bei Yu; David Z. Pan
Название: Design for Manufacturability with Advanced Lithography
ISBN: 3319203843 ISBN-13(EAN): 9783319203843
Издательство: Springer
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Цена: 74530.00 T
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Описание: This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).

Автор: Clivia M. Sotomayor Torres
Название: Alternative Lithography
ISBN: 1461348366 ISBN-13(EAN): 9781461348368
Издательство: Springer
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Цена: 139750.00 T
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Описание: Good old Gutenberg could not have imagined that his revolutionary printing concept which so greatly contributed to dissemination of knowledge and thus today `s wealth, would have been a source of inspiration five hundred years later.

Автор: Seongbo Shim; Youngsoo Shin
Название: Physical Design and Mask Synthesis for Directed Self-Assembly Lithography
ISBN: 3319762931 ISBN-13(EAN): 9783319762937
Издательство: Springer
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Цена: 102480.00 T
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Описание: This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

Автор: Hyongsok T. Soh; Kathryn Wilder Guarini; Calvin F.
Название: Scanning Probe Lithography
ISBN: 1441948945 ISBN-13(EAN): 9781441948946
Издательство: Springer
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Цена: 158380.00 T
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Описание: Scanning Probe Lithography (SPL) describes recent advances in the field of scanning probe lithography, a high resolution patterning technique that uses a sharp tip in close proximity to a sample to pattern nanometer-scale features on the sample.

Автор: Kamil A. Valiev
Название: The Physics of Submicron Lithography
ISBN: 1461364612 ISBN-13(EAN): 9781461364610
Издательство: Springer
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Цена: 186330.00 T
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Описание: In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer.