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Harsh Environment Electronics: Interconnect Materials and Performance Assessment, Ahmed Sharif


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Автор: Ahmed Sharif
Название:  Harsh Environment Electronics: Interconnect Materials and Performance Assessment
ISBN: 9783527344192
Издательство: Wiley
Классификация:





ISBN-10: 3527344195
Обложка/Формат: Hardback
Страницы: 400
Вес: 0.91 кг.
Дата издания: 17.04.2019
Серия: Physics
Язык: English
Размер: 247 x 179 x 37
Читательская аудитория: Professional & vocational
Ключевые слова: Mechanical engineering & materials,Electronics & communications engineering,Physics
Основная тема: Physics,Mechanical engineering & materials,Electronics & communications engineering
Подзаголовок: Interconnect materials and performance assessment
Ссылка на Издательство: Link
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Поставляется из: Англии
Описание: Provides in-depth knowledge on novel materials that make electronics work under high-temperature and high-pressure conditions

This book reviews the state of the art in research and development of lead-free interconnect materials for electronic packaging technology. It identifies the technical barriers to the development and manufacture of high-temperature interconnect materials to investigate into the complexities introduced by harsh conditions. It teaches the techniques adopted and the possible alternatives of interconnect materials to cope with the impacts of extreme temperatures for implementing at industrial scale. The book also examines the application of nanomaterials, current trends within the topic area, and the potential environmental impacts of material usage.

Written by world-renowned experts from academia and industry, Harsh Environment Electronics: Interconnect Materials and Performance Assessment covers interconnect materials based on silver, gold, and zinc alloys as well as advanced approaches utilizing polymers and nanomaterials in the first section. The second part is devoted to the performance assessment of the different interconnect materials and their respective environmental impact.

-Takes a scientific approach to analyzing and addressing the issues related to interconnect materials involved in high temperature electronics
-Reviews all relevant materials used in interconnect technology as well as alternative approaches otherwise neglected in other literature
-Highlights emergent research and theoretical concepts in the implementation of different materials in soldering and die-attach applications
-Covers wide-bandgap semiconductor device technologies for high temperature and harsh environment applications, transient liquid phase bonding, glass frit based die attach solution for harsh environment, and more
-A pivotal reference for professionals, engineers, students, and researchers

Harsh Environment Electronics: Interconnect Materials and Performance Assessment is aimed at materials scientists, electrical engineers, and semiconductor physicists, and treats this specialized topic with breadth and depth.


Автор: ASME
Название: ASME 2015 13th International Technical Conference and Exhibition on Packaging and Integration of Electronic and Photonic Microsystems, Volume 2: Advanced Electronics and Photonics, Packaging Materials and Processing, Interconnect and Reliability, Fundamen
ISBN: 0791856895 ISBN-13(EAN): 9780791856895
Издательство: Mare Nostrum (Eurospan)
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Цена: 234690.00 T
Наличие на складе: Невозможна поставка.
Описание: Presents print proceedings of the ASME 2015 13th International Technical Conference and Exhibition on Packaging and Integration of Electronic and Photonic Microsystems (IPACK2015): Volume 2: Advanced Electronics and Photonics, Packaging Materials and Processing, Interconnect and Reliability, Fundamentals of Thermal and Fluid Transport in Nano, Micro, and Mini Scales.

Integrated Optical Interconnect Architectures for Embedded Systems

Автор: Ian O`Connor; Gabriela Nicolescu
Название: Integrated Optical Interconnect Architectures for Embedded Systems
ISBN: 1489992049 ISBN-13(EAN): 9781489992048
Издательство: Springer
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Цена: 113180.00 T
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Описание: This book highlights current research in optical interconnect technologies and architectures. Particular emphasis is given to the ways photonic components are assembled into architectures to address the needs of data-intensive on-chip communication.

Multi-Net Optimization of VLSI Interconnect

Автор: Konstantin Moiseev; Avinoam Kolodny; Shmuel Wimer
Название: Multi-Net Optimization of VLSI Interconnect
ISBN: 1461408202 ISBN-13(EAN): 9781461408208
Издательство: Springer
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Цена: 102480.00 T
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Interconnect Technology and Design for Gigascale Integration

Автор: Jeffrey A. Davis; James D. Meindl
Название: Interconnect Technology and Design for Gigascale Integration
ISBN: 1461350883 ISBN-13(EAN): 9781461350880
Издательство: Springer
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Цена: 139750.00 T
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Описание: This book is jointly authored by leading academic and industry researchers. The material is unique in that it spans IC interconnect topics ranging from IBM`s revolutionary copper process to an in-depth exploration into interconnect-aware computer architectures.

High-Speed Digital System Design: A Handbook of Interconnect Theory and Design Practices

Автор: Stephen H. Hall
Название: High-Speed Digital System Design: A Handbook of Interconnect Theory and Design Practices
ISBN: 0471360902 ISBN-13(EAN): 9780471360902
Издательство: Wiley
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Цена: 146730.00 T
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Описание: An understanding of high speed interconnect phenomena is necessary for modern designs such as routing and layout of computer motherboards. Computers have reached speeds where digital design must provide for these effects. The problem is that most engineers active today have not been trained in this subject.

Low Power Interconnect Design

Автор: Sandeep Saini
Название: Low Power Interconnect Design
ISBN: 1461413222 ISBN-13(EAN): 9781461413226
Издательство: Springer
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Цена: 102480.00 T
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Описание: As well as offering practical solutions for delay and power reduction for on-chip interconnects and buses, this book provides in-depth descriptions of the problem of signal delay and extra power consumption and possible solutions for delays and glitches.

Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect

Автор: Jie Cheng
Название: Research on Chemical Mechanical Polishing Mechanism of Novel Diffusion Barrier Ru for Cu Interconnect
ISBN: 9811061645 ISBN-13(EAN): 9789811061646
Издательство: Springer
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Цена: 121110.00 T
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Описание: This thesis addresses selected unsolved problems in the chemical mechanical polishing process (CMP) for integrated circuits using ruthenium (Ru) as a novel barrier layer material.

IC Interconnect Analysis

Автор: Mustafa Celik; Larry Pileggi; Altan Odabasioglu
Название: IC Interconnect Analysis
ISBN: 1475776748 ISBN-13(EAN): 9781475776744
Издательство: Springer
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Цена: 130430.00 T
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Описание: As integrated circuit (IC) feature sizes scaled below a quarter of a micron, thereby defining the deep submicron (DSM) era, there began a gradual shift in the impact on performance due to the metal interconnections among the active circuit components.


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