Scanning Probe Lithography, Hyongsok T. Soh; Kathryn Wilder Guarini; Calvin F.

Автор: Mack
Название: Fundamental Principles of Optical Lithography: The Science of Microfabrication
ISBN: 0470727306 ISBN-13(EAN): 9780470727300
Издательство: Wiley
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Цена: 61190.00 T
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Описание: Fundamental Principles of Optical Lithography: The Science of Microfabrication presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. This sole-authored text includes optional computer simulation exercises as well as problems at the end of each chapter.

Автор: Stephen C. Minne; Scott R. Manalis; Calvin F. Quat
Название: Bringing Scanning Probe Microscopy up to Speed
ISBN: 0792384660 ISBN-13(EAN): 9780792384663
Издательство: Springer
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Цена: 139750.00 T
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Описание: Bringing Scanning Probe Microscopy Up to Speed introduces the principles of scanning probe systems with particular emphasis on techniques for increasing speed. First, fast scanning systems for single probes are treated and, second, systems with multiple probes operating in parallel are presented.

Автор: Paula M. Vilarinho; Yossi Rosenwaks; Angus Kingon
Название: Scanning Probe Microscopy: Characterization, Nanofabrication and Device Application of Functional Materials
ISBN: 1402030177 ISBN-13(EAN): 9781402030178
Издательство: Springer
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Цена: 371750.00 T
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Описание: Starting with the general properties of functional materials the authors present an updated overview of the fundamentals of Scanning Probe Techniques and the application of SPM techniques to the characterization of specified functional materials such as piezoelectric and ferroelectric and to the fabrication of some nano electronic devices.

Автор: Stephen C. Minne; Scott R. Manalis; Calvin F. Quat
Название: Bringing Scanning Probe Microscopy up to Speed
ISBN: 1461373530 ISBN-13(EAN): 9781461373537
Издательство: Springer
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Цена: 93160.00 T
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Описание: Bringing Scanning Probe Microscopy Up to Speed introduces the principles of scanning probe systems with particular emphasis on techniques for increasing speed. First, fast scanning systems for single probes are treated and, second, systems with multiple probes operating in parallel are presented.

Автор: T. Sakurai; Y. Watanabe
Название: Advances in Scanning Probe Microscopy
ISBN: 3540667180 ISBN-13(EAN): 9783540667186
Издательство: Springer
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Цена: 153720.00 T
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Описание: Covers several important topics in the field of scanning probe microscopy. These include a realistic theory of atom-resolving atomic force microscopy (AFM), fundamentals of MBE growth of III-V compound semiconductors, and more. This book is of interest to those involved in using scanning probe microscopy.

Автор: Kamil A. Valiev
Название: The Physics of Submicron Lithography
ISBN: 1461364612 ISBN-13(EAN): 9781461364610
Издательство: Springer
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Цена: 186330.00 T
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Описание: In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer.

Автор: Hyongsok T. Soh; Kathryn Wilder Guarini; Calvin F.
Название: Scanning Probe Lithography
ISBN: 1441948945 ISBN-13(EAN): 9781441948946
Издательство: Springer
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Цена: 158380.00 T
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Описание: Scanning Probe Lithography (SPL) describes recent advances in the field of scanning probe lithography, a high resolution patterning technique that uses a sharp tip in close proximity to a sample to pattern nanometer-scale features on the sample.

Автор: T. Sakurai; Y. Watanabe
Название: Advances in Scanning Probe Microscopy
ISBN: 3642630847 ISBN-13(EAN): 9783642630842
Издательство: Springer
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Цена: 93160.00 T
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Описание: There have been many books published on scanning tunneling microscopy (STM), atomic force microscopy (AFM) and related subjects since Dr. Cerd Binnig and Dr. Heinrich Rohrer invented STM in 1982 and AFM in 1986 at IBM Research Center in Zurich, Switzerland.

Автор: Weimin Zhou
Название: Nanoimprint Lithography: An Enabling Process for Nanofabrication
ISBN: 3662510863 ISBN-13(EAN): 9783662510865
Издательство: Springer
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Цена: 104480.00 T
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Описание: With hundreds of explanatory figures and tables, this volume deals with the latest achievements in hot areas such as nanofabrication and nanotechnology, with multi-disciplinary results on promising low-cost, high-throughput nanostructure manufacturing methods.

Автор: Bei Yu; David Z. Pan
Название: Design for Manufacturability with Advanced Lithography
ISBN: 3319203843 ISBN-13(EAN): 9783319203843
Издательство: Springer
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Цена: 74530.00 T
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Описание: This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).

Автор: Bei Yu; David Z. Pan
Название: Design for Manufacturability with Advanced Lithography
ISBN: 3319373935 ISBN-13(EAN): 9783319373935
Издательство: Springer
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Цена: 74530.00 T
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Описание: This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).

Автор: Wayne M. Moreau
Название: Semiconductor Lithography
ISBN: 1461282284 ISBN-13(EAN): 9781461282280
Издательство: Springer
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Цена: 113190.00 T
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Описание: In fabricating a semiconductor device such as a transistor, a series of hot processes consisting of vacuum film deposition, oxidations, and dopant implantation are all patterned into microscopic circuits by the wet processes of lithography.