Vapor Crystal Growth and Characterization, Ching-Hua Su
Автор: Radermacher, Reinhard , Hwang, Yunho Название: Vapor Compression Heat Pumps with Refrigerant Mixtures ISBN: 0367454114 ISBN-13(EAN): 9780367454111 Издательство: Taylor&Francis Рейтинг: Цена: 64300.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание:
Amidst tightening requirements for eliminating CFC's, HCFC's, halons, and HFC's from use in air conditioning and heat pumps, the search began for replacements that are environmentally benign, non-flammable, and similar to the banned refrigerants in system-level behavior. Refrigerant mixtures are increasingly used as working fluids because they demonstrate desirable thermodynamic, feasibility, and safety characteristics.
Vapor Compression Heat Pumps with Refrigerant Mixtures provides the first comprehensive, single-source treatment of working fluid mixtures and their applications in vapor compression systems. The authors explain in detail the thermodynamics of refrigerant mixtures, which is vastly more complex than that of individual refrigerants, as well as the fundamentals of various refrigeration cycles and methods for improving their efficiency. They also include important discussions on heat transfer and pressure drop correlations, experimental performance measurements and examples of using refrigerants and their mixtures, and critical operational issues such as control issues, refrigerant mixing, and mass fraction shifts.
Assembling reviews of the scattered literature on the subject and reflecting two decades of research by the authors, Vapor Compression Heat Pumps with Refrigerant Mixtures prepares you to design and implement systems that take the best advantage of fluid mixtures, confronting the challenges and grasping the opportunities that they present.
Автор: Tay Название: Chemical Vapor Deposition Growth and Characterization of Two-Dimensional Hexagonal Boron Nitride ISBN: 981108808X ISBN-13(EAN): 9789811088087 Издательство: Springer Рейтинг: Цена: 102480.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This thesis focuses on the growth of a new type of two-dimensional (2D) material known as hexagonal boron nitride (h-BN) using chemical vapor deposition (CVD). This came as a major surprise to many working in the 2D field, as it had been generally assumed that hexagonal-shaped h-BN was impossible due to energy dynamics.
Автор: Roland Yingjie Tay Название: Chemical Vapor Deposition Growth and Characterization of Two-Dimensional Hexagonal Boron Nitride ISBN: 9811342466 ISBN-13(EAN): 9789811342462 Издательство: Springer Рейтинг: Цена: 102480.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This thesis focuses on the growth of a new type of two-dimensional (2D) material known as hexagonal boron nitride (h-BN) using chemical vapor deposition (CVD). It also presents several significant breakthroughs in the authors’ understanding of the growth mechanism and development of new growth techniques, which are now well known in the field. Of particular importance is the pioneering work showing experimental proof that 2D crystals of h-BN can indeed be hexagonal in shape. This came as a major surprise to many working in the 2D field, as it had been generally assumed that hexagonal-shaped h-BN was impossible due to energy dynamics. Beyond growth, the thesis also reports on synthesis techniques that are geared toward commercial applications. Large-area aligned growth and up to an eightfold reduction in the cost of h-BN production are demonstrated. At present, all other 2D materials generally use h-BN as their dielectric layer and for encapsulation. As such, this thesis lays the cornerstone for using CVD 2D h-BN for this purpose.
Автор: Alexei Kryukov; Vladimir Levashov; Puzina Yulia Название: Non-Equilibrium Phenomena near Vapor-Liquid Interfaces ISBN: 3319000829 ISBN-13(EAN): 9783319000824 Издательство: Springer Рейтинг: Цена: 60940.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: This book presents information on the development of a non-equilibrium approach to the study of heat and mass transfer problems using vapor-liquid interfaces, and demonstrates its application to a broad range of problems.
Автор: Shigeo Fujikawa; Takeru Yano; Masao Watanabe Название: Vapor-Liquid Interfaces, Bubbles and Droplets ISBN: 3642267955 ISBN-13(EAN): 9783642267956 Издательство: Springer Рейтинг: Цена: 113180.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Easily readable and exact, this book is concerned with the kinetic boundary condition for both the plane and curved vapor-liquid interfaces. It also devotes attention to the fluid dynamics boundary condition for Navier-Stokes (fluid dynamics) equations.
Автор: Srinivasan Sivaram Название: Chemical Vapor Deposition ISBN: 1475747535 ISBN-13(EAN): 9781475747539 Издательство: Springer Рейтинг: Цена: 95770.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition.
Автор: Johnson Название: Properties and Processing of Vapor-Deposited Coatings ISBN: 1107413915 ISBN-13(EAN): 9781107413917 Издательство: Cambridge Academ Цена: 28510.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Автор: Chris R. Kleijn; Christoph Werner Название: Modeling of Chemical Vapor Deposition of Tungsten Films ISBN: 3034877439 ISBN-13(EAN): 9783034877435 Издательство: Springer Рейтинг: Цена: 46570.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors.
Автор: Harro Tr?ubel Название: New Materials Permeable to Water Vapor ISBN: 3642642063 ISBN-13(EAN): 9783642642067 Издательство: Springer Рейтинг: Цена: 87070.00 T Наличие на складе: Есть у поставщика Поставка под заказ. Описание: Natural products like wool, leather or cotton are permeable to water vapor. Various areas of application include the medical sector for implants and dialysis, the industrial sector for filtration or for processes requiring the slow release of substances, and the consumer sector for leather substitutes or performance textiles.
The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology.
This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques.
Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications.
Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD)
Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles
Presents comparisons of different Cat-CVD methods which are usually not found in research papers
Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry.
Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.
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