Random Signals and Processes Primer with MATLAB, Gordana Jovanovic Dolecek

Автор: Won Young Yang
Название: Signals and Systems with MATLAB
ISBN: 3642424376 ISBN-13(EAN): 9783642424373
Издательство: Springer
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Цена: 69650.00 T
Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: This text covers most of the theoretical foundations and mathematical derivations that will be used in higher-level related subjects such as signal processing, communication and control, minimizing the mathematical difficulty and computational burden.

Автор: Khler Anna
Название: Electronic Processes in Organic Semiconductors
ISBN: 3527332928 ISBN-13(EAN): 9783527332922
Издательство: Wiley
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Цена: 68590.00 T
Наличие на складе: Поставка под заказ.
Описание: The first advanced textbook to focus on the fundamentals in a brief, coherent and comprehensive way. Based on one of the author`s proven lecture course, it prepares students to understand the many multi-authored books available that discuss a particular aspect in more detail.

Автор: Posseme, Nicolas
Название: Plasma Etching Processes for CMOS Devices Realization
ISBN: 1785480960 ISBN-13(EAN): 9781785480966
Издательство: Elsevier Science
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Цена: 62320.00 T
Наличие на складе: Поставка под заказ.
Описание: Plasma etching has long enabled the perpetuation of Moore's Law. Today, etch compensation helps to create devices that are smaller than 20 nm. But, with the constant downscaling in device dimensions and the emergence of complex 3D structures (like FinFet, Nanowire and stacked nanowire at longer term) and sub 20 nm devices, plasma etching requirements have become more and more stringent.Now more than ever, plasma etch technology is used to push the limits of semiconductor device fabrication into the nanoelectronics age. This will require improvement in plasma technology (plasma sources, chamber design, etc.), new chemistries (etch gases, flows, interactions with substrates, etc.) as well as a compatibility with new patterning techniques such as multiple patterning, EUV lithography, Direct Self Assembly, ebeam lithography or nanoimprint lithography.This book presents these etch challenges and associated solutions encountered throughout the years for transistor realization.

Автор: Chang Hyeong Soo
Название: Simulation-based Algorithms for Markov Decision Processes
ISBN: 144715021X ISBN-13(EAN): 9781447150213
Издательство: Springer
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Цена: 130610.00 T
Наличие на складе: Есть у поставщика Поставка под заказ.
Описание: The updated 2nd edition of this book covers MDPs in constrained settings and with uncertain transition properties; approximation stochastic annealing, a population-based on-line simulation-based algorithm; game-theoretic method for solving MDPs and more.