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Coaxial Lithography, Ozel


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Цена: 104480.00T
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Автор: Ozel
Название:  Coaxial Lithography
ISBN: 9783319454139
Издательство: Springer
Классификация:



ISBN-10: 3319454137
Обложка/Формат: Hardback
Страницы: 92
Вес: 0.36 кг.
Дата издания: 2016
Серия: Springer Theses
Язык: English
Иллюстрации: 49 black & white illustrations, 4 colour illustrations, biography
Размер: 234 x 156 x 8
Читательская аудитория: Professional & vocational
Основная тема: Chemistry
Ссылка на Издательство: Link
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Поставляется из: Германии
Описание: This thesis focuses on the electrochemical synthesis of multi-segmented nanowires. In contrast to previous work, which was largely limited to one-dimensional modifications, Tuncay Ozel presents a technique, termed coaxial Lithography (COAL), which allows for the synthesis of coaxial nanowires in a parallel fashion with sub-10 nanometer resolution in both the axial and radial dimensions. This work has significantly expanded current synthetic capabilities with respect to materials generality and the ability to tailor two-dimensional growth in the formation of core-shell structures. These developments have enabled fundamental and applied studies which were not previously possible. The COAL technique will increase the capabilities of many researchers who are interested in studying light-matter interactions, nanoparticle assembly, solution-dispersible nanoparticles and labels, semiconductor device physics and nanowire biomimetic probe preparation. The methodology and results presented in this thesis appeal to researchers in nanomaterial synthesis, plasmonics, biology, photovoltaics, and photocatalysis.
Дополнительное описание: Introduction to Plasmonics, Templated Electrochemical Synthesis, and On-Wire Lithography.- 1D Nanowire Synthesis: Extending the OWL Toolbox with Semiconductors to Explore Plasmon-Exciton Interactions in the Form of Long-Range Optical Nanoscale Rulers.- Hy


Materials and Processes for Next Generation Lithography,11

Автор: Robinson, Alex
Название: Materials and Processes for Next Generation Lithography,11
ISBN: 0081003544 ISBN-13(EAN): 9780081003541
Издательство: Elsevier Science
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Цена: 151590.00 T
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Описание: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. . These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. . This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication.


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